2009
DOI: 10.14723/tmrsj.34.597 View full text |Buy / Rent full text
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Abstract: We show a quantitative analysis of the strain field beneath the Si 3 N 4 /Si(001) interface formed by nitrogen-hydrogen (NH) radicals (the Xe/NH 3 plasma nitridation). The strain field was investigated by using a multiple-wave X-ray diffraction phenomenon, i.e., interaction between the Bragg reflection and crystal-truncation-rod (CTR) scattering. We present a master formula for the amplitude of CTR scattering from a crystal with strain. We constructed model functions for the strain field and determined several… Show more

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